| ZHANG Ze,ZHANG Yuantao,ZHANG Lin,ZHAO Dongcai,ZHANG Tengfei,ZHANG Shihong.Research Progress of Large Particle Defect Removal inArc Ion Plating Coatings[J],54(1):1-16 |
| Research Progress of Large Particle Defect Removal inArc Ion Plating Coatings |
| Received:August 23, 2024 Revised:October 17, 2024 |
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| DOI：10.16490/j.cnki.issn.1001-3660.2025.01.001 |
| KeyWord:arc ion plating large particle removal arc source magnetic filtration processing parameters |
| Author | Institution |
| ZHANG Ze |
Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education,Anhui University of Technology, Anhui Maanshan , China |
| ZHANG Yuantao |
Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education,Anhui University of Technology, Anhui Maanshan , China |
| ZHANG Lin |
Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education,Anhui University of Technology, Anhui Maanshan , China |
| ZHAO Dongcai |
Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education,Anhui University of Technology, Anhui Maanshan , China |
| ZHANG Tengfei |
Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education,Anhui University of Technology, Anhui Maanshan , China |
| ZHANG Shihong |
Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education,Anhui University of Technology, Anhui Maanshan , China |
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| Abstract: |
| Arc ion plating (AIP) is a widely used physical vapor deposition (PVD) technique for producing coatings with high hardness, high deposition efficiency, high corrosion resistance, and good adhesion strength with the substrate, and these coatings find significant applications in various fields, including cutting tools and molds. However, large particle defects on the coating surface limit its application in high-precision industries such as precision processing, high-density protective coatings, sensor insulating films, etc. During the operation in harsh environments such at elevated temperature or under corrosive media, the large particle defects often act as nucleation sites for corrosion attack. The corrosive media penetrate the coating through these defects and reach the substrate, leading to a catastrophic failure of the coating. Therefore, minimizing the content of such large particle defects on the coating surface in arc ion plating technology has become an important aspect of advancing arc ion plating technology. In recent years, relevant institutions and researchers have focused on understanding and mitigating large particle defects in arc ion plating technology and have made significant progress in this field. This review explored recent advancements and practical implementation of arc ion plating technology for controlling large particle defects and discussed the current problems and solutions of arc ion plating technology. Understanding the mechanisms of large particle formation, transmission, and deposition into the substrate was crucial for developing effective control strategies. A detailed review of the suppression methods and approaches employed by various researchers at each of the three stages was conducted to understand their application and effectiveness thoroughly. Large particles originated from droplets spattered from the target surface during the arcing process. Researchers achieved more uniform and rapid arc spot movement trajectories by optimizing the arc source design, improving the magnetic field distribution, and increasing the arc spot movement speed. These enhancements ultimately reduced the distribution density and the number of large particles. Large particles were transported through the plasma and influenced by electric and magnetic fields. Therefore, physical shielding, magnetic filtration, and auxiliary anode assistance were employed to manipulate the trajectories of ions and large particles. These methods reduced the probability of large particles reaching the substrate or coating surface. Large particles that reached the substrate could cause defects on the coating surface, impacting its quality and performance. Applying a negative bias to the substrate could repel large particles, preventing their deposition. In addition, substrate material and surface condition could also influence the adhesion of large particles and their impacts on the coating. Other factors influencing large particle defects included target arc current, chamber pressure, reaction gas type, deposition temperature, and deposition time. These parameters could be adjusted to reduce defects efficiently and at low cost. In summary, controlling large particle defects in AIP is essential for producing high-quality coatings. By understanding the mechanisms involved and implementing effective control strategies, researchers have made significant progress in reducing defect levels. Future advancements in technology and research will continue to drive improvements in AIP processes and expand its applications. In the future, efforts to reduce large particle defects in arc ion plating should focus on precise control of the target magnetic field strength and distribution to minimize droplet spattering at the source using dynamic magnetic fields, exploring optimal magnetic filtration arrangements and bias magnetic field distributions to balance coating deposition efficiency and quality, and adopting new substrate biasing technologies such as short pulse and magnetic biasing to nearly eliminate large particle defects before they reach the substrate. |
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