| CHEN Yi,ZHANG Simiao,QU Weiran,ZHENG Shujia,SUN Yijia,GONG Aijun.Advances in Research into Abrasive Materials and Their Properties in the New Steel Polishing Solution[J],53(3):88-100, 122 |
| Advances in Research into Abrasive Materials and Their Properties in the New Steel Polishing Solution |
| Received:January 05, 2023 Revised:May 11, 2023 |
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| DOI：10.16490/j.cnki.issn.1001-3660.2024.03.009 |
| KeyWord:CMP polishing solution steel abrasive polishing mechanism |
| Author | Institution |
| CHEN Yi |
School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing , China |
| ZHANG Simiao |
School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing , China |
| QU Weiran |
School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing , China |
| ZHENG Shujia |
School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing , China |
| SUN Yijia |
School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing , China |
| GONG Aijun |
School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing , China |
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| Abstract: |
| Abrasives mainly play a mechanical role in polishing solution. The physical and chemical properties of abrasives, such as hardness, particle size and concentration, are critical factors affecting the performance of CMP and have a greater impact on polishing efficiency. Whereas China has dependence and high demand on foreign polishing solution, and indicators including the accuracy fail to meet the market requirements, and at the same time, because the abrasives plays a vital role in the polishing performance of polishing solution, it is imperative to find better modified abrasives or new abrasive materials to promote the development of chemical mechanical polishing technology. |
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