WANG Dong,CAI Chang-long,MI Qian,WANG Lin-bo,LIU Hua-chen,HOU Jie.Magnetic Field Simulation and Structure Design of Cylindrical Magnetron Sputtering Target[J],52(8):371-379 |
Magnetic Field Simulation and Structure Design of Cylindrical Magnetron Sputtering Target |
Received:June 24, 2022 Revised:September 14, 2022 |
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DOI:10.16490/j.cnki.issn.1001-3660.2023.08.032 |
KeyWord:magnetron sputtering target magnetic field simulation finite element analysis optimization structural design cylindrical type |
Author | Institution |
WANG Dong |
College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China |
CAI Chang-long |
College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China |
MI Qian |
College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China |
WANG Lin-bo |
College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China |
LIU Hua-chen |
College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China |
HOU Jie |
College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China |
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Abstract: |
In order to explore the possibility of a device which can be used to coat the outer surface of cylindrical workpiece, a new type of cylindrical magnetron sputtering target is designed. Sputtering takes place on the inner surface of the cylindrical target, and the outer surface of the workpiece is coated from all sides to improve the large volume and complex structure of the traditional coating device for long tube workpiece. Firstly, the initial structure of the cylindrical magnetron sputtering target was designed, and then the magnetostatic non-current simulation module in the finite element analysis software |
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