WANG Dong,CAI Chang-long,MI Qian,WANG Lin-bo,LIU Hua-chen,HOU Jie.Magnetic Field Simulation and Structure Design of Cylindrical Magnetron Sputtering Target[J],52(8):371-379
Magnetic Field Simulation and Structure Design of Cylindrical Magnetron Sputtering Target
Received:June 24, 2022  Revised:September 14, 2022
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DOI:10.16490/j.cnki.issn.1001-3660.2023.08.032
KeyWord:magnetron sputtering target  magnetic field simulation  finite element analysis  optimization  structural design  cylindrical type
                 
AuthorInstitution
WANG Dong College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China
CAI Chang-long College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China
MI Qian College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China
WANG Lin-bo College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China
LIU Hua-chen College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China
HOU Jie College of Ordnance Science and Technology, Xi'an Technological University, Xi'an , China
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Abstract:
      In order to explore the possibility of a device which can be used to coat the outer surface of cylindrical workpiece, a new type of cylindrical magnetron sputtering target is designed. Sputtering takes place on the inner surface of the cylindrical target, and the outer surface of the workpiece is coated from all sides to improve the large volume and complex structure of the traditional coating device for long tube workpiece. Firstly, the initial structure of the cylindrical magnetron sputtering target was designed, and then the magnetostatic non-current simulation module in the finite element analysis software
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