| YAN Jie-wen,YAN Qiu-sheng,PAN Ji-sheng.Friction and Wear Characteristics of Electrochemically Corroded Surfaces of GaN Wafers[J],52(6):208-222 |
| Friction and Wear Characteristics of Electrochemically Corroded Surfaces of GaN Wafers |
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| DOI：10.16490/j.cnki.issn.1001-3660.2023.06.018 |
| KeyWord:GaN wafer electrochemistry corrosion friction and wear friction coefficient micromorphology |
| Author | Institution |
| YAN Jie-wen |
School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou , China;Guangzhou Institute of Measurement and Testing Technology, Guangzhou , China |
| YAN Qiu-sheng |
School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou , China |
| PAN Ji-sheng |
School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou , China |
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| Abstract: |
| GaN wafer is a chemically stable semiconductor material. Electrochemical action can effectively corrode the surface of GaN wafer. By choosing different electrochemical corrosion electrolyte solutions and different corrosion potentials, the electrochemical corrosion effect on the wafer surface can be regulated. In this paper, the friction and wear characteristics of electrochemically corroded GaN wafer surfaces were studied in order to better understand the material removal mechanism of electrochemical mechanical polishing on the surface of GaN wafers. |
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