CAO Li-na,SHAO Wen-ting,CHEN Jian,WANG Fu-qiang,WU Shang-kun,YANG Wei,YAO Yu-hong,LIU Jiang-nan.Effect of Zr Target Power on Microstructure and Performance of (WMoTaNb) ZrxN Films[J],51(9):160-167
Effect of Zr Target Power on Microstructure and Performance of (WMoTaNb) ZrxN Films
  
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DOI:10.16490/j.cnki.issn.1001-3660.2022.09.016
KeyWord:reaction magnetron sputtering  (WMoTaNb)ZrxN films  hardness  film-substrate adhesion  tribology performance  ablation resistance performance
                       
AuthorInstitution
CAO Li-na School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China
SHAO Wen-ting School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China
CHEN Jian School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China
WANG Fu-qiang School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China
WU Shang-kun School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China
YANG Wei School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China
YAO Yu-hong School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China
LIU Jiang-nan School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China
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Abstract:
      As a physical vapor deposition method, magnetron sputtering technology can improve the surface performance of matrix without changing the substrate material. Besides, the deposition rate of the magnetron sputtering becomes faster and the film prepared by magnetron sputtering is uniformly dense and has high adhesion force. In this paper, reaction magnetron sputtering technology were used to prepare a series of (WMoTaNb)ZrxN films by changing Zr target power and this paper aimed to study the effect of Zr target power on the microstructure and performance of (WMoTaNb)ZrxN films.
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