CAO Li-na,SHAO Wen-ting,CHEN Jian,WANG Fu-qiang,WU Shang-kun,YANG Wei,YAO Yu-hong,LIU Jiang-nan.Effect of Zr Target Power on Microstructure and Performance of (WMoTaNb) ZrxN Films[J],51(9):160-167 |
Effect of Zr Target Power on Microstructure and Performance of (WMoTaNb) ZrxN Films |
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DOI:10.16490/j.cnki.issn.1001-3660.2022.09.016 |
KeyWord:reaction magnetron sputtering (WMoTaNb)ZrxN films hardness film-substrate adhesion tribology performance ablation resistance performance |
Author | Institution |
CAO Li-na |
School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China |
SHAO Wen-ting |
School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China |
CHEN Jian |
School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China |
WANG Fu-qiang |
School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China |
WU Shang-kun |
School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China |
YANG Wei |
School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China |
YAO Yu-hong |
School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China |
LIU Jiang-nan |
School of Materials Science and Chemical Engineering, Xi'an Technological University, Xi'an , China |
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Abstract: |
As a physical vapor deposition method, magnetron sputtering technology can improve the surface performance of matrix without changing the substrate material. Besides, the deposition rate of the magnetron sputtering becomes faster and the film prepared by magnetron sputtering is uniformly dense and has high adhesion force. In this paper, reaction magnetron sputtering technology were used to prepare a series of (WMoTaNb)ZrxN films by changing Zr target power and this paper aimed to study the effect of Zr target power on the microstructure and performance of (WMoTaNb)ZrxN films. |
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