WANG Jun,LIU Ying,HU Jing-ru.Microstructure and Wettability of TiO2 Thin Films Prepared by Dip Coating Method[J],46(2):58-62
Microstructure and Wettability of TiO2 Thin Films Prepared by Dip Coating Method
Received:August 18, 2016  Revised:February 20, 2017
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DOI:10.16490/j.cnki.issn.1001-3660.2017.02.009
KeyWord:TiO2 thin film  process parameter  microstructure  optical properties  wettability
        
AuthorInstitution
WANG Jun 1.School of Mechanical and Electrical Engineering, Nanchang University, Nanchang , China; 2.Jiangxi Key Laboratory of Surface Engineering, Jiangxi Science and Technology Normal University, Nanchang , China
LIU Ying School of Mechanical and Electrical Engineering, Nanchang University, Nanchang , China
HU Jing-ru School of Mechanical and Electrical Engineering, Nanchang University, Nanchang , China
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Abstract:
      The work aims to investigate the relationship between process parameters and microstructure, optical properties, or wettability of TiO2 thin films. With tetrabutyl titanate as raw materials and ethanol as solvent, the TiO2 thin films were prepared on glass substrates with different process parameters (withdrawal times and withdrawal speed) by virtue of sol-gel dip coating method. The microstructure, optical properties and wettability of TiO2 thin films prepared with different process parameters were analyzed by optical surface microscopy, ultraviolet and visible spectrophotometer and contact angle tester. Microstructure of TiO2 thin films was influenced by withdrawal times and withdrawal speed. Uniform and dense films were produced provided with withdrawal times of 2 times and withdrawal speed of 3 to 7 cm/min. Thickness gradient (1 nm/μm) was present in the withdrawal direction. Transmitted spectrum showed that the TiO2 thin films were transparent in visible region. The absorption edge related to the withdrawal process. The forbidden band width of TiO2 film prepared at withdrawal speed of 7 cm/min and withdrawal times of 2 times was 3.57 eV while contact angle was 14.8°. The microstructure, optical properties and wettability of TiO2 thin films are influenced by withdrawal speed and withdrawal times. Uniform, dense and hydrophilic semiconductor TiO2 thin can be fabricated by adjusting the withdrawal process parameters.
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