| HUANG Mei-dong,XU Shi-peng,LIU Ye,XUE Li,PAN Yu-peng,FAN Xi-ying.Influence of Negative Bias on TiAlN Films by Arc Ion Plating[J],(6):1-3,6 |
| Influence of Negative Bias on TiAlN Films by Arc Ion Plating |
| Received:June 25, 2012 Revised:December 20, 2012 |
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| DOI： |
| KeyWord:arc ion plating TiAlN thin film negative bias |
| Author | Institution |
| HUANG Mei-dong |
College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin , China |
| XU Shi-peng |
College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin , China |
| LIU Ye |
College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin , China |
| XUE Li |
College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin , China |
| PAN Yu-peng |
College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin , China |
| FAN Xi-ying |
College of Physics and Electronic Information Science, Tianjin Normal University, Tianjin , China |
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| Abstract: |
| TiAlN thin films were fabricated via arc ion plating on the W18Cr4V high-speed steel under different negative biases. The influence of negative bias on the microstructure, phase, and crystalline orientation, hardness, and deposition rate of the films were investigated. The results show that the films have a coarse surface at too high or too low biases, resulting in lower hardness. The largest deposition rate is achieved at -200 V bias. The TiAlN thin film has a (111) preferred orientation when deposited at -150 V bias, where the largest hardness is achieved. |
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