HONG Yi,ZHANG Xiao-yan,LI Guang-yu,MA Xiao-dong,AO Qi-yan.Study on Cu-W Composite Electroplating Process[J],37(5):64-65,84
Study on Cu-W Composite Electroplating Process
Received:July 07, 2008  Revised:October 10, 2008
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KeyWord:Composite electrodeposition  Composite deposits  Process parameter  Electrical contact material  Cu-W alloy
              
AuthorInstitution
HONG Yi School of Materials Science and Metallurgical Engineering, Guizhou University, Guiyang , China
ZHANG Xiao-yan 1. School of Materials Science and Metallurgical Engineering, Guizhou University, Guiyang , China;2. Guizhou Key Laboratory for Mechanical Behavior and Microstructure of Materials, Guizhou University, Guiyang , China
LI Guang-yu School of Materials Science and Metallurgical Engineering, Guizhou University, Guiyang , China
MA Xiao-dong School of Materials Science and Metallurgical Engineering, Guizhou University, Guiyang , China
AO Qi-yan School of Materials Science and Metallurgical Engineering, Guizhou University, Guiyang , China
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Abstract:
      Contact materials are demanded to have finer electric erosion resistance and anti-welding properties, but pure copper cant meet the requirement easily. The Cu-W composite deposits was formed on the surface of pure copper by composite electro deposition, to meet the service performance of contact material. The influence of W particulate content in Cu-W composite deposits including W mass concentration, current density, stimng intention and temperature on W particulate content in Cu-W composite deposits was laid special stress on, and the optimum process parameters for composite electrodeposition were determined by orthogonal experimentations. And the optimal process: W mass concentration 35 g/L, current density 4A/dm2 , stimng intention 600 r/min, the temperature of 500℃.
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