| LIU Jing-ming,LV Fan-xiu.The Study on the Oxidation Kinetics of CVD Free-standing Diamond Films[J],36(4):7-10 |
| The Study on the Oxidation Kinetics of CVD Free-standing Diamond Films |
| Received:March 13, 2007 Revised:August 10, 2007 |
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| DOI： |
| KeyWord:CVD diamond films High temperature oxidation Oxidation kinetics |
| Author | Institution |
| LIU Jing-ming |
Beijing Institute of Electro-machining, Beijing 10083 , China |
| LV Fan-xiu |
Materials Science and Engineering College, Beijing University of Science and Technology, Beijing , China |
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| Abstract: |
| The kinetics of reaction between the DC arc plasma jet CVD free-standing diamond films and oxygen gas was studied by thermogravimetry in order to understand the mechanism of the oxidation of that. The results indicate that the apparent order of the reaction is about 0. 63 , and the apparent activation energy is 220kj/mol. From the result of X-ray and Raman we know that three stage mechanistic schemes are developed involving desorption of hydrogen and adsorption of oxygen on CVD diamond surface, surface chemical reaction, and desorption of adsorbed species to CO or C02. |
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