谷佳宾,周永涛,金杰,李刘合,王纪武,王珊珊.基体偏压对中频磁控溅射TiBx涂层结构及性能的影响[J].表面技术,2025,54(11):100-110.
GU Jiabin,ZHOU Yongtao,JIN Jie,LI Liuhe,WANG Jiwu,WANG Shanshan.Effect of Substrate Bias on Microstructure and Properties of TiBx Coatings Prepared by Mid-frequency Magnetron Sputtering[J].Surface Technology,2025,54(11):100-110 |
| 基体偏压对中频磁控溅射TiBx涂层结构及性能的影响 |
| Effect of Substrate Bias on Microstructure and Properties of TiBx Coatings Prepared by Mid-frequency Magnetron Sputtering |
| 投稿时间：2024-10-09 修订日期：2025-03-24 |
| DOI：10.16490/j.cnki.issn.1001-3660.2025.11.008 |
| 中文关键词: 中频磁控溅射 TiBx涂层 基体偏压 微观组织结构 力学性能 |
| 英文关键词:mid-frequency magnetron sputtering TiBx coatings substrate bias microstructure mechanical properties |
| 基金项目:中央高校基本科研业务费专项资金(2024JBZX009，2023JBMC018) |
| 作者 | 单位 |
| 谷佳宾 | 北京交通大学 机械与电子控制工程学院 载运工具先进制造与测控技术教育部重点实验室 北京 100044 |
| 周永涛 | 火箭军工程大学，西安 710025 |
| 金杰 | 清华大学 机械工程系，北京 100084 |
| 李刘合 | 北京航空航天大学 机械工程及自动化学院，北京 100191 |
| 王纪武 | 北京交通大学 机械与电子控制工程学院 载运工具先进制造与测控技术教育部重点实验室 北京 100044 |
| 王珊珊 | 潍坊市寒亭区农业机械服务中心，山东 潍坊 261100 |
|
| Author | Institution |
| GU Jiabin | College of Mechanical, Electronic and Control Engineering,Key Laboratory of Vehicle Advanced Manufacturing, Measuring and Control Technology, Ministry of Education, Beijing Jiaotong University, Beijing 100044, China |
| ZHOU Yongtao | Rocket Force University of Engineering, Xi'an 710025, China |
| JIN Jie | Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China |
| LI Liuhe | College of Mechanical Engineering and Automation, Beihang University, Beijing 100191, China |
| WANG Jiwu | College of Mechanical, Electronic and Control Engineering,Key Laboratory of Vehicle Advanced Manufacturing, Measuring and Control Technology, Ministry of Education, Beijing Jiaotong University, Beijing 100044, China |
| WANG Shanshan | Weifang Hanting District Agricultural Machinery Service Center, Shandong Weifang 261100, China |
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| 中文摘要: |
| 目的 改善TiBx涂层的致密性，提高TiBx涂层的力学性能。方法 采用中频磁控溅射技术制备TiBx涂层，探究TiBx涂层的结构和性能在不同基体偏压下的演变规律，并分析TiBx涂层的抗氧化性能和摩擦磨损性能。通过扫描电子显微镜对涂层的表面形貌和断面形貌进行表征。利用电子探针分析涂层的化学成分，采用X射线衍射仪测试TiBx涂层的择优取向，并利用sin2ψ法评估TiBx涂层的残余应力。通过纳米压痕仪测试TiBx涂层的纳米硬度和弹性模量。通过划痕法和洛氏压痕法来评价TiBx涂层的膜基结合强度。结果 在不同基体偏压下，采用中频磁控溅射技术制备的TiBx涂层均表现出TiB2-(001)择优取向，涂层的柱状晶结构随着基体偏压的升高逐渐细化，涂层的致密性得到显著提高。涂层的残余应力(绝对值)和纳米硬度随着基体偏压的升高逐渐增大，涂层的硬度最高达到39.1 GPa。涂层的膜基结合强度随着基体偏压的升高逐渐降低，在偏压不高于100 V时，涂层的膜基结合强度为HF1级。在退火温度不高于600 ℃时，TiBx涂层中未发现新相的形成，且该涂层仍具有明显的TiB2-(001)择优取向。随着环境温度的升高，TiBx涂层的摩擦因数呈先升高后降低的趋势。涂层的摩擦因数在温度500 ℃时达到最高值(0.82)，在温度600 ℃时降至0.65，涂层在不同环境温度下的磨损量均约为0。结论 随着基体偏压的升高，成膜离子的轰击作用增强，TiBx涂层的晶粒细化，其致密性提高，导致涂层的残余应力和纳米硬度逐渐升高，结合力逐渐下降。在温度不高于600 ℃时，TiBx涂层具有优异的抗氧化性能和摩擦磨损性能。 |
| 英文摘要: |
| This paper aims to improve the density of TiBx coatings and optimize the mechanical properties of TiBx coatings. TiBx coatings are prepared under different substrate bias conditions by mid-frequency magnetron sputtering technology (mfMS), and the evolution of microstructure and mechanical properties of TiBx coatings under different substrate bias is explored. The oxidation resistance and high-temperature tribological performance of the TiBx coatings are analyzed. The chemical composition of TiBx coatings is characterized by electron probe microanalysis. The surface topography, cross-sectional topography, and thickness of TiBx coatings are characterized by scanning electron microscopy. The preferred orientation of TiBx coatings is evaluated by X-ray diffractometer. The residual stress of TiBx coatings is tested by the sin2ψ method. The hardness and elastic modulus of TiBx coatings are measured by nanoindenter. The adhesion of TiBx coatings is evaluated by the scratch method and the Rockwell C indentation method. The high-temperature tribological performance of TiBx coatings is evaluated by ball-on-disk friction tester. The high-temperature oxidation resistance of the coatings is characterized with a muffle furnace in an air environment. The results show that the prepared TiBx coatings show a significant (001) preference orientation. As the bias increases, the grains of the TiBx coatings are refined, and the density of the TiBx coatings is increased. As the bias increases, the residual stress of the TiBx coatings gradually increases, reaching a maximum of −5.9 GPa. The hardness and the elastic modulus of the TiBx coatings gradually increase with the increase of the substrate bias pressure. The hardness of TiBx coatings reaches the highest 39.1 GPa, and the elastic modulus of the TiBx coatings reaches the highest 421.7 GPa. As the bias pressure increases, the adhesion strength of the coatings gradually decreases. When the substrate bias voltage is −70 V, the adhesion of the coatings is HF1 class and the critical load FLc3 is 90.9 N. When the substrate bias voltage is −100 V, the adhesion of the coatings is HF1 class and the critical load FLc3 is 71.6 N. But at a substrate bias voltage of −130 V, the adhesion of the TiBx coatings is significantly reduced to HF3 class and the critical load FLc3 is reduced to 40.9 N. At temperature lower than 600 ℃, no new phase formation is found in the TiBx coatings, and there is still an obvious TiB2-(001) preferential orientation. With the increase of temperature, the friction coefficient of TiBx coatings first increases and then decreases, reaching a maximum of 0.82 at 500 ℃ and a minimum of 0.65 at 600 ℃. The wear rates of the TiBx coatings at different temperature are all about 0. With the increase of substrate bias, the bombardment effect of film-forming ions is enhanced, which promotes an increase in density and grain refinement of the TiBx coatings. As a result, with the increase of substrate bias, the residual stress and nanohardness of the TiBx coatings gradually increase, and the adhesion of the coatings monotonically decreases. At temperature below 600 ℃, the TiBx coatings have excellent oxidation and abrasion resistance. |
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