谷佳宾,李建勇,金杰,李刘合.溅射技术与基体偏压对TiBx涂层结构和力学性能的影响[J].表面技术,2024,53(15):206-215.
GU Jiabin,LI Jianyong,JIN Jie,LI Lliuhe.Effects of Sputtering Technology and Bias Voltage on Structure and Mechanical Properties of TiBx Coatings[J].Surface Technology,2024,53(15):206-215 |
| 溅射技术与基体偏压对TiBx涂层结构和力学性能的影响 |
| Effects of Sputtering Technology and Bias Voltage on Structure and Mechanical Properties of TiBx Coatings |
| 投稿时间：2023-08-01 修订日期：2023-08-24 |
| DOI：10.16490/j.cnki.issn.1001-3660.2024.15.019 |
| 中文关键词: 磁控溅射 TiBx涂层 基体偏压 Hybrid 微观组织结构 力学性能 |
| 英文关键词:magnetron sputtering TiBx coatings bias voltage Hybrid microstructure mechanical properties |
| 基金项目:中央高校基本科研业务费专项(2023JBMC018，2023JBZY021) |
|
|
| Author | Institution |
| GU Jiabin | College of Mechanical, Electronic and Control Engineering,Key Laboratory of Vehicle Advanced Manufacturing, Measuring and Control Technology, Ministry of Education, Beijing Jiaotong University, Beijing 100044, China |
| LI Jianyong | College of Mechanical, Electronic and Control Engineering,Key Laboratory of Vehicle Advanced Manufacturing, Measuring and Control Technology, Ministry of Education, Beijing Jiaotong University, Beijing 100044, China |
| JIN Jie | College of Mechanical, Electronic and Control Engineering,Key Laboratory of Vehicle Advanced Manufacturing, Measuring and Control Technology, Ministry of Education, Beijing Jiaotong University, Beijing 100044, China |
| LI Lliuhe | College of Mechanical Engineering and Automation, Beihang University, Beijing 100191, China |
|
| 摘要点击次数: |
| 全文下载次数: |
| 中文摘要: |
| 目的 改善TiBx涂层的残余应力，提高其力学性能。方法 采用不同的磁控溅射技术(dcMS、HiPMS、Hybrid)和基体偏压制备TiBx涂层。通过电子探针显微分析仪(EPMA)测试TiBx涂层的化学成分，采用扫描电子显微镜(SEM)和X射线衍射仪(XRD)表征涂层的表面形貌、组织结构特征、相组成和择优取向，通过sin2ψ法、纳米压痕仪和洛氏压痕法分别测试TiBx涂层的残余应力、纳米硬度和膜层/基体结合强度。结果 溅射技术和基体偏压对TiBx涂层的组织结构和力学性能都有着显著的影响。在基体旋转条件下，不同溅射技术和基体偏压制备的涂层均呈现出TiB2-(001)择优取向。随基体偏压的升高，涂层的残余应力呈现出先增大、后减小的规律。偏压相同时，HiPIMS技术制备的TiBx涂层具有最高的残余应力。随着基体偏压的增加，TiBx涂层的纳米硬度和弹性模量不断增加，在偏压为–130 V时，Hybrid-TiBx涂层具有最高的纳米硬度(40.1 GPa)。偏压相同时，dcMS-TiBx和Hybrid-TiBx涂层表现出优异的膜层/基体结合强度(HF1-HF2级)，而HiPIMS涂层表现出较差的膜层/基体结合强度(HF1-HF4级)。结论 溅射技术和基体偏压对TiBx涂层的微观组织结构和力学性能有着重要的影响，Hybrid模式结合了dcMS模式和HiPMS模式的优点，Hybrid-TiBx涂层呈现出最优的综合力学性能(高的纳米硬度、沉积速率和膜层/基体结合强度)。 |
| 英文摘要: |
| For large-scale industrial production, the rotation of the substrate is critical for the uniformity of coating deposition. The work aims to reduce the residual stress of TiBx coatings and improve the mechanical properties of TiBx coatings prepared under rotational substrate conditions. TiBx coatings were synthesized on rotating M2 high-speed steel substrates by different magnetron sputtering techniques (dcMS, HiPMS and Hybrid) under different bias voltages. The effects of sputtering technology and bias voltage on the structure and mechanical properties of TiBx coatings were explored. The M2 high-speed steel substrates were ultrasonically cleaned in ethanol, acetone, and isopropanol for a total of 45 minutes to remove potential residues. Before coating deposition, the substrates were etched by applying a pulse bias voltage. To ensure a good adhesion of TiBx coatings on the M2 steel, a Ti interlayer and a titanium nitride (TiN) interlayer were firstly prepared in a dcMS process by both Ti targets. During the deposition of TiBx coatings, the TiB2 cathodes were operated with an average power of 2 kW in the dcMS, HiPIMS, and Hybrid mode. During the TiBx coating deposition, the substrate temperature was approximately 500 ℃, and the substrates rotated in a two-fold rotation at a speed of 1 r/mim. The dc bias voltage varied and was set to −70, −100, and −130 V. The chemical composition of the TiBx coatings was determined by an electron probe microanalysis (EPMA). The cross-sectional morphology and topography of TiBx coatings were characterized by scanning electron microscopy (SEM). The phase composition and crystal orientation of TiBx coatings were characterized by X-ray diffractometer (XRD). The residual stress of TiBx coatings was evaluated by the sin2ψ method. The hardness and elastic modulus of TiBx coatings were characterized by a nanoindenter G200 equipped with a Berkovich diamond probe in continuous stiffness mode (CSM). In addition, the adhesion behavior of the TiBx coatings was analyzed by the Rockwell C adhesion test. The results indicate that different sputtering modes and substrate bias voltages can significantly affect the structure and mechanical properties of the TiBx coatings. Compared with the TiB2 target, the TiBx coatings exhibit overstoichiometric with the excessive B. All the HiPIMS-TiBx coatings reveal a dense structure and smooth topography. With the increase of the bias voltage, the coatings prepared by other sputtering techniques progressively exhibit a dense structure. Under the condition of substrate rotation, all the TiBx coatings still exhibit the desirable (001) preferred orientation due to the high-temperature heating and ion bombardment. With the bias voltage increasing, the residual stresses of the coatings firstly increase and then decrease, while the hardness and elastic modulus increase monotonously. dcMS- and Hybrid-TiBx coatings exhibit excellent adhesion strength (class HF1-HF2), while HiPIMS-TiBx coatings show the worst adhesion strength (class HF1-HF4). Especially noteworthy is that the Hybrid-mode preparation coatings perfectly combine the advantages of dcMS- and HiPMS-modes, with the highest hardness (40.1±1.3) GPa at −130 V, low residual stress, high deposition rate, and excellent adhesion strength. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| 关闭 |
|
|
|
渝公网安备 50010702501715号