陈倚,张偲淼,屈蔚然,郑书佳,孙一嘉,弓爱君.新型钢抛光液中磨料的种类及其性能研究进展[J].表面技术,2024,53(3):88-100, 122. CHEN Yi,ZHANG Simiao,QU Weiran,ZHENG Shujia,SUN Yijia,GONG Aijun.Advances in Research into Abrasive Materials and Their Properties in the New Steel Polishing Solution[J].Surface Technology,2024,53(3):88-100, 122 |
新型钢抛光液中磨料的种类及其性能研究进展 |
Advances in Research into Abrasive Materials and Their Properties in the New Steel Polishing Solution |
投稿时间:2023-01-05 修订日期:2023-05-11 |
DOI:10.16490/j.cnki.issn.1001-3660.2024.03.009 |
中文关键词: 化学机械抛光 抛光液 钢 磨料 抛光机理 |
英文关键词:CMP polishing solution steel abrasive polishing mechanism |
基金项目:北京科技大学教育教学重大教改项目(JG2021ZD01);北京科技大学校级规划教材项目(JC2021YB040);大学生创新创业项目 |
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Author | Institution |
CHEN Yi | School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing 100083, China |
ZHANG Simiao | School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing 100083, China |
QU Weiran | School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing 100083, China |
ZHENG Shujia | School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing 100083, China |
SUN Yijia | School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing 100083, China |
GONG Aijun | School of Chemistry and Biological Engineering,Beijing Key Laboratory for Science and Application of Functional Molecular and Crystalline Materials, University of Science and Technology Beijing, Beijing 100083, China |
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中文摘要: |
磨料在抛光液中主要起机械作用,磨料的理化性质,如硬度、粒径、浓度等,是影响化学机械抛光(Chemical Mechanical Polishing,CMP)性能的重要因素,对抛光效率有较大影响。针对我国抛光液对外依赖、需求量大,但精度等指标达不到市场要求等问题,同时由于磨料在抛光液的抛光性能中起着至关重要的作用,因此寻求效果更好的改性磨料或新型磨料材料,以促进化学机械抛光技术的发展势在必行。故此,归纳汇总近年来国内外研制出的新型钢抛光液,聚焦于抛光液磨料这一重要组分中不同物质的物化性质及其作用,对抛光性能(如材料去除率、表面粗糙度和光泽度等)的影响等,分类别阐述了不同物质的优劣势、复配协同作用以及在现有抛光液中的效果,为之后抛光液配方研究中磨料的选择提供参考。归纳总结发现,混合与复合磨料较单一磨料有较大的提升,稀土掺杂、核/壳结构等改进存在较大的研究价值,组分间的复配协同作用对抛光性能的提升有一定作用。最后,基于目前钢抛光液应用中存在的问题以及现有的具有前景的技术,对钢抛光液中磨料的发展进行了展望。 |
英文摘要: |
Abrasives mainly play a mechanical role in polishing solution. The physical and chemical properties of abrasives, such as hardness, particle size and concentration, are critical factors affecting the performance of CMP and have a greater impact on polishing efficiency. Whereas China has dependence and high demand on foreign polishing solution, and indicators including the accuracy fail to meet the market requirements, and at the same time, because the abrasives plays a vital role in the polishing performance of polishing solution, it is imperative to find better modified abrasives or new abrasive materials to promote the development of chemical mechanical polishing technology. |
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