宋智辉,代明江,李洪,洪悦,林松盛,石倩,苏一凡.电弧离子镀偏压对TiAlSiN涂层结构及性能的影响[J].表面技术,2020,49(9):306-314.
SONG Zhi-hui,DAI Ming-jiang,LI Hong,HONG Yue,LIN Song-sheng,SHI Qian,SU Yi-fan.Effect of Arc Ion Plating Bias on Structure and Properties of TiAlSiN Films[J].Surface Technology,2020,49(9):306-314 |
| 电弧离子镀偏压对TiAlSiN涂层结构及性能的影响 |
| Effect of Arc Ion Plating Bias on Structure and Properties of TiAlSiN Films |
| 投稿时间：2019-12-27 修订日期：2020-09-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2020.09.035 |
| 中文关键词: TiAlSiN 离子镀 偏压 结合力 耐磨性 高温氧化 |
| 英文关键词:TiAlSiN ion plating bias adhesion wear resistance high temperature oxidation |
| 基金项目:国家重点研发计划项目（2016YFB0300400）；广东省科技计划项目（2020B010184001，2019BT02C629）；广东省科学院科技计划项目（2018GDASCX-0402） |
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| Author | Institution |
| SONG Zhi-hui | 1.School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, China; 2.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
| DAI Ming-jiang | 1.School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, China; 2.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
| LI Hong | 2.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
| HONG Yue | 2.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
| LIN Song-sheng | 1.School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, China; 2.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
| SHI Qian | 2.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
| SU Yi-fan | 2.National Engineering Laboratory for Modern Materials Surface Engineering Technology, Key Lab of Guangdong for Modern Surface Engineering Technology, Guangdong Institute of New Materials, Guangzhou 510651, China |
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| 中文摘要: |
| 目的 探究脉冲偏压对TiAlSiN涂层结构及力学性能、耐磨性能、抗氧化性能的影响规律及机制。方法 采用阴极电弧离子镀膜技术，调控偏压参数并在M2高速钢上沉积TiAlSiN涂层，利用SEM、XRD、3D轮廓仪、金相显微镜、划痕仪、摩擦磨损试验仪等仪器及高温氧化试验，对涂层结构及性能进行分析表征。结果 偏压为50 V时，涂层主要为AlN相；偏压高于75 V时，涂层以固溶的(Ti,Al)N相为主，TiAlSiN涂层存在较强的(200)面择优取向。偏压由50 V增大至150 V时，涂层的致密性增加，表面粗糙度先降低后上升，涂层结合力先增大后降低。TiAlSiN涂层的磨损方式主要是磨粒磨损，受物相结构、涂层致密性的影响，偏压为100~150 V时，涂层的耐磨性能优异。涂层1000 ℃氧化4 h后，表面氧化程度不同，主要受物相结构、致密性、表面孔隙的多重影响，hcp-AlN相比(Ti,Al)N相更易氧化；偏压增大使得涂层沉积更为致密，氧化层深度变浅；涂层孔隙增加，表面形成的Al2O3团簇增多。结论 偏压100 V下TiAlSiN涂层的综合性能最优，涂层结合力为46.7 V，硬度为3276HV0.025，表面粗糙度最低，耐磨性能较好且高温下抗氧化性能最强。 |
| 英文摘要: |
| The work aims to reveal the influence laws and mechanism of pulsed bias on structure, wear resistance and oxidation resistance of TiAlSiN films. TiAlSiN films were deposited on the surface of M2 high speed steel by cathodic arc ion plating technology with different pulsed bias parameters. Microstructures and properties of the films were characterized by SEM, XRD, 3D profilometer, metallographic microscope, scratch tester, friction and wear tester and high temperature oxidation test. The main phase structure of TiAlSiN films was AlN when pulsed bias was 50 V. When pulsed bias exceeded 75 V, the films were mainly composed of (Ti,Al)N phase and the preferred orientation of films on (200) was obvious. With the pulsed bias increasing to 150 V from 50 V, the films became more compact, surface roughness firstly decreased and then increased, but the adhesion of films firstly increased and then decreased. The main wear mode of TiAlSiN films was abrasive wear and the wear resistance was mainly affected by phase structure and film compactness. When pulsed bias was 100~150 V, the wear resistance was excellent. After oxidation for 4 h at 1000 ℃, the surface was oxidized to different extent, which was mainly affected by phase structure, compactness and surface porosity. Compared with (Ti,Al)N phase, the films with hcp-AlN phase was easier to be oxidized. The films were more compact and depth of the oxidized layer became shallower with the increase of bias. At the same time, as the number of pores increased, more Al2O3 clusters were formed on the surface. Under the pulsed bias of 100 V, TiAlSiN films have the most comprehensive properties, the adhesion is 46.7 V, the hardness is 3276HV0.025, the surface roughness is the lowest, the wear resistance is better and the oxidation resistance is the strongest at high temperature. |
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