王付胜,何鹏,郁佳琪,胡隆伟,刘燕,陈亚军.氩离子轰击对中频-直流磁控溅射铝薄膜耐蚀性能的影响[J].表面技术,2019,48(3):185-194.
WANG Fu-sheng,HE Peng,YU Jia-qi,HU Long-wei,LIU Yan,CHEN Ya-jun.Effects of Argon Ion Bombardment on Corrosion Resistance of Al Film Deposited by Medium Frequency Direct Current Magnetron Sputtering[J].Surface Technology,2019,48(3):185-194 |
| 氩离子轰击对中频-直流磁控溅射铝薄膜耐蚀性能的影响 |
| Effects of Argon Ion Bombardment on Corrosion Resistance of Al Film Deposited by Medium Frequency Direct Current Magnetron Sputtering |
| 投稿时间：2018-08-19 修订日期：2019-03-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2019.03.026 |
| 中文关键词: 中频-直流磁控溅射 铝膜层 氩离子轰击 耐腐蚀性能 |
| 英文关键词:middle-frequency and direct-current combined magnetron sputtering Al film argon ion bombardment corrosion resistance |
| 基金项目:中国民航大学专项资助（3122018Z003） |
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| Author | Institution |
| WANG Fu-sheng | 1.Sino-European Institute of Aviation Engineering, Civil Aviation University of China, Tianjin 300300, China |
| HE Peng | 1.Sino-European Institute of Aviation Engineering, Civil Aviation University of China, Tianjin 300300, China |
| YU Jia-qi | 1.Sino-European Institute of Aviation Engineering, Civil Aviation University of China, Tianjin 300300, China |
| HU Long-wei | 2.Guizhou Aer-ospace Precision Co., Ltd, Zunyi 563006, China |
| LIU Yan | 3.Tianjin Aerospace Precision Co., Ltd, Tianjin 300300, China |
| CHEN Ya-jun | 1.Sino-European Institute of Aviation Engineering, Civil Aviation University of China, Tianjin 300300, China |
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| 中文摘要: |
| 目的 研究氩离子轰击这种后处理工艺对TC4钛合金表面铝膜层结构和耐蚀性能的影响，为飞机钛合金紧固件的表面腐蚀防护工作提供理论依据。方法 首先采用中频-直流相结合的磁控溅射离子镀方法在Ti-6Al-4V钛合金（TC4）基体表面制备铝膜，通过电化学方法研究膜层厚度和腐蚀时间对耐蚀性能的影响规律。其次，采用氩离子轰击工艺对膜层进行后处理，探讨氩离子轰击对膜层耐蚀性能的影响，同时利用SEM、EDS、AFM表征界面形貌，并分析耐蚀机理。最后，通过显微硬度仪和微纳米划痕仪测试膜层表面硬度和界面结合性能。结果 随着膜层厚度从11.1 μm增加至15.9 μm，自腐蚀电流密度下降了76.6%，而当厚度由15.9 μm增加至20.3 μm时，自腐蚀电流密度又下降了24.3%。腐蚀浸泡时间达到24 h时，腐蚀产物在疏松氧化膜内的累积和覆盖阻碍了膜层的腐蚀；在48~72 h时，随着铝膜层相对疏松的腐蚀产物逐渐脱落，腐蚀逐渐加剧；浸泡至96 h时，涂层表面出现宏观腐蚀坑。氩离子轰击后，膜层表面粗糙度增加，铝膜层自腐蚀电流密度由未轰击时的1.65×10-8 A/cm2大幅度降低至7.29×10-10 A/cm2。结论 随着铝膜层厚度的增加，膜层耐蚀性逐渐增强。膜层在浸泡初期和中期，均具有较强的耐腐蚀性能；浸泡后期，膜层逐渐发生点蚀，耐蚀性能下降。表面氩离子轰击后，膜层的耐蚀性能、显微硬度和界面结合性能显著提高。 |
| 英文摘要: |
| The work aims to study the effect of argon ion bombardment on the structure and corrosion resistance of Al film on TC4 titanium alloy, and to provide theoretical basis for the surface corrosion protection of aeronautical titanium alloy fasteners. The Al film was prepared on the surface of Ti-6Al-4V (TC4) titanium alloy substrate by magnetron sputtering ion plating combined with middle frequency and direct current. The influence of film thickness and corrosion time on the corrosion resistance was studied by electrochemical method. In addition, with the post-treatment of the film by argon ion bombardment, the influence of argon ion bombardment on the corrosion resistance of Al film was explored, the SEM, EDS and AFM were used to characterize the interfacial morphology and to analyze the corrosion mechanism. The micro hardness tester and micro-nano scratch tester were applied to test the surface hardness and adhesion strength. With the increase of film thickness from 11.1 μm to 15.9 μm, the corrosion current density decreased about 76.6%, and when the thickness increased from 15.9 μm to 20.3 μm, the corrosion current density decreased by 24.3%. As the immersion time reached 24 h, the accumulation and coverage of corrosion products in the loose oxide film hindered the corrosion of the Al film. For 48~72 h, the corrosion of the Al film was aggravated gradually with the exfoliation of the relatively loose corrosion products. The macroscopic corrosion pits appeared on the surface of the film after 96 h. After Ar+ ion bombardment, the surface roughness increased, the self-corrosion current density of aluminum film decreased from 1.65×10-8 A/cm2 to 7.29×10-8 A/cm2. With the increase of the thickness of the aluminum film, the corrosion resistance is gradually enhanced. The film has strong corrosion resistance in the early and middle stages of immersion, and the pitting corrosion occurs in the film after later immersion stage, and the corrosion resistance of the film decreases. After argon ion bombardment, the corrosion resistance, microhardness and interfacial bonding properties of the film are improved. |
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