郭美键,罗虎,王长兵,尹韶辉,陈逢军,郭源帆.氧化锆陶瓷大抛光模磁流变抛光试验研究[J].表面技术,2018,47(7):28-34.
GUO Mei-jian,LUO Hu,WANG Chang-bing,YIN Shao-hui,CHEN Feng-jun,GUO Yuan-fan.Experimental Study on Magnetorheological Finishing Using Large Polishing Tool for Zirconia Ceramic Plane[J].Surface Technology,2018,47(7):28-34 |
| 氧化锆陶瓷大抛光模磁流变抛光试验研究 |
| Experimental Study on Magnetorheological Finishing Using Large Polishing Tool for Zirconia Ceramic Plane |
| 投稿时间：2018-03-01 修订日期：2018-07-20 |
| DOI：10.16490/j.cnki.issn.1001-3660.2018.07.005 |
| 中文关键词: 氧化锆陶瓷 大抛光模 磁流变抛光 材料去除率 表面质量 超光滑表面 |
| 英文关键词:zirconia ceramic large polishing tool magnetorheological polishing materials removal rate surface quality ultra-smooth surface |
| 基金项目:国家自然科学基金项目(51675171) |
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| Author | Institution |
| GUO Mei-jian | National Engineering Research Center for High Efficiency Grinding, Hunan University, Changsha 410082, China |
| LUO Hu | National Engineering Research Center for High Efficiency Grinding, Hunan University, Changsha 410082, China |
| WANG Chang-bing | Hunan Chiopt Optical Technology Co., Ltd, Changsha 410202, China |
| YIN Shao-hui | National Engineering Research Center for High Efficiency Grinding, Hunan University, Changsha 410082, China |
| CHEN Feng-jun | National Engineering Research Center for High Efficiency Grinding, Hunan University, Changsha 410082, China |
| GUO Yuan-fan | National Engineering Research Center for High Efficiency Grinding, Hunan University, Changsha 410082, China |
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| 中文摘要: |
| 目的 研发一种高效、高质量氧化锆陶瓷超光滑表面加工技术。方法 采用大抛光模磁流变抛光方式加工氧化锆陶瓷，利用自主研发的磁流变平面抛光装置，配制含有金刚石磨粒的磁流变抛光液，通过设计单因素实验，研究抛光时间、工作间隙、工件转速和抛光槽转速等主要工艺参数对氧化锆陶瓷平面磁流变加工性能的影响，并对材料去除率和表面粗糙度进行分析。结果 在工作间隙为1.4 mm、工件转速为100 r/min、抛光槽转速为25 r/min的工艺条件下，表面粗糙度在达到饱和之前随时间的增加而降低。抛光30 min达到饱和，表面粗糙度Ra达到0.7 nm。继续延长抛光时间，表面粗糙度不再改善。氧化锆陶瓷的材料去除率随着工件转速和抛光槽转速的增加而增大，随着工作间隙的增大而减小。当工件转速为300 r/min时，材料去除率可以达到1.03 mg/min；抛光槽转速为25 r/min时，材料去除率可以达到0.80 mg/min；工作间隙为1.0 mm时，材料去除率最高可达0.77 mg/min。结论 采用大抛光模磁流变抛光方法可以提高氧化锆陶瓷的材料去除率，同时获得纳米级表面粗糙度，实现氧化锆陶瓷的高效超光滑表面加工。 |
| 英文摘要: |
| The work aims to develop a high efficiency and quality ultra-smooth surface polishing technique for zirconia ceramic. The zirconia ceramic was processed in the method of magnetorheological finishing. A self-developed magnetorheological polishing device was used, and magnetorheological polishing fluids containing diamond abrasives were prepared. A single-factor experiment was designed to study the effects of main process parameters including polishing time, working gap, workpiece speed and polishing trough speed on magnetorheological polishing properties of zirconia ceramics. The material removal rate (MRR) and surface roughness was analyzed using precision electronic balances and white light interferometry profiler, respectively. Provided with the process parameters as follows: working gap of 1.4 mm, workpiece speed of 100 r/min and trough speed of 25 r/min, the workpiece surface roughness Ra decreased over time before reaching saturation, and finally reached saturation value 0.7 nm after 30 min polishing. As polishing time advanced, surface roughness was no longer improved anymore. The MRR of zirconia ceramics increased with the increase of workpiece speed and trough speed, and decreased with the increase of working gap. The MRR could be up to 1.03 mg/min at workpiece speed of 300 r/min, 0.80 mg/min at trough speed of 25 r/min, and 0.77 mg/min at working gap of 1.0 mm. Higher MRR of zirconia ceramic and nanoscale surface roughness can be improved in the method of magnetorheological finishing based on large polishing tool, and efficient ultra-smooth surface processing of the zirconia ceramic can be achieved. |
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