种法力.晶体硅表面制绒参数优化分析[J].表面技术,2014,43(5):87-90.
CHONG Fa-li.Parameter Optimization of Texture of Crystalline Silicon Wafers[J].Surface Technology,2014,43(5):87-90 |
| 晶体硅表面制绒参数优化分析 |
| Parameter Optimization of Texture of Crystalline Silicon Wafers |
| 投稿时间：2014-04-17 修订日期：2014-06-16 |
| DOI： |
| 中文关键词: 单晶硅 制绒 反射率 |
| 英文关键词:monocrystalline silicon texturization reflectance |
| 基金项目:江苏省高校自 然科学基金( 12KJD480002) ; 江苏省“ 青蓝工程冶 资助项目 |
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| 中文摘要: |
| 目 的 研究酸( HF 和 HNO3) 、碱( NaOH) 腐 蚀液对晶 体硅制 绒的 影响。 方法 通过改变 NaOH浓度、异丙醇浓度、腐蚀时间 研究单晶硅片 腐蚀, 通过改变酸溶液浓度比研究多 晶 硅片 腐 蚀, 通过分析微观形貌及表面反射率等考察制备晶体硅制绒工艺参数。 结果 单晶 硅最佳的腐蚀液配比为: NaOH 质量浓度 15 g/L, 热碱温度 80 ℃ , 异丙醇体积分数 15% ~ 20% , 腐蚀时间 10 min。 在最优化参数下, 晶体硅绒表面金字塔大小均匀 ,高度约为 5 μm, 相邻金字塔间 彼此相连, 硅表面反射率降低至 15% 。 在 V( HF) :V( HNO3) : V( CH3COOH) = 10 : 1 : 10,腐蚀速率为 2 μm/min 时, 晶体硅绒表面呈现较好的沟 壑状绒面结构。 结论 溶液酸碱性的强弱和异丙醇对晶体硅制绒有较大影响,并且直接影响晶体硅的表面反射率。 |
| 英文摘要: |
| Objective To study the effect of the mixture solution of NaOH, HF and HNO3 on the texture of crystalline silicon wafers. Methods The monocrystalline silicon wafer was corroded by changing NaOH concentration, isopropyl alcohol ( IPA) concentration and corrosion time. The polycrystalline silicon wafer ( Poly-Si) was corroded by changing the concentration of acid solution. The texture was analyzed by means of the SEM images and the surface reflectance of silicon. Results The optimum corrosion parameters were 15 g/L for NaOH, 15% ~ 20% for IPA volume fraction, 10 minutes for corrosion time at 80 ℃ for thermokalite. At these optimized parameters, the size of pyramids was even with height of about 5 μm. The adjacent pyramids were linked to each other and the surface reflectance of silicon was reduced to 15% . The corrosion rate was 2 μm/min at the mixture solution of V( HF) : V( HNO3 ) : V( CH3 COOH) = 10 : 1 : 10, and the texture showed like ravine. Conclusion The acid-base property of the solution and the addition of IPA have significant influence on the texture of crystalline silicon and directly affect the surface reflectance of silicon. |
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