魏永强,魏永辉,蒋志强,田修波.放置方向和沉积时间对 Ti 大颗粒分布状态的影响[J].表面技术,2014,43(5):6-10,41.
WEI Yong-qiang,WEI Yong-hui,JIANG Zhi-qiang,TIAN Xiu-bo.Influence of Placement Orientation and Deposition Time on the Morphology and Distribution of Ti Macroparticles[J].Surface Technology,2014,43(5):6-10,41 |
| 放置方向和沉积时间对 Ti 大颗粒分布状态的影响 |
| Influence of Placement Orientation and Deposition Time on the Morphology and Distribution of Ti Macroparticles |
| 投稿时间：2014-04-17 修订日期：2014-08-04 |
| DOI： |
| 中文关键词: 电弧离 子镀 TiN 大颗粒 放置方向 沉积时间 |
| 英文关键词:arc ion plating TiN macroparticles placement orientation deposition time |
| 基金项目:国家自 然科学基金( 51401182) ; 航空科学基金( 2012ZE55011 ) ; 河南省高校科技创新团队支持计划( 2012IRTSTHN014) |
|
|
| Author | Institution |
| WEI Yong-qiang | School of Mechatronics Engineering, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China;Engineering Technology Research Center of Aviation Manufacturing & Equipment, University of Henan, Zhengzhou 450015,China;State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China |
| WEI Yong-hui | School of Mechatronics Engineering, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China;Engineering Technology Research Center of Aviation Manufacturing & Equipment, University of Henan, Zhengzhou 450015,China |
| JIANG Zhi-qiang | School of Mechatronics Engineering, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China;Engineering Technology Research Center of Aviation Manufacturing & Equipment, University of Henan, Zhengzhou 450015,China |
| TIAN Xiu-bo | State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China |
|
| 摘要点击次数: |
| 全文下载次数: |
| 中文摘要: |
| 目 的 研究基体表面和靶表面不同 放置方向以及沉积时间 对 Ti 大颗粒形貌和分布规律的影响。方法 利 用 电弧离 子镀方法在基体上制备 TiN 薄膜, 采用 扫描电 子显微镜??TiN 薄膜的 表面形貌, 利用 ImageJ 图 像软件对 TiN 薄膜表面中 Ti 大颗粒的数目 和尺寸进行分析。 结果 靶基间 距保持 25 cm, 当基体表面与 靶表面垂直放置时, 薄膜表面的大颗粒数目 和所占 面积比比平行放置时要少, 同 时出 现了 典型的长条状大颗粒; 随着沉积时间 从 5 min 增加到 50 min, 大颗粒数目 和所占 面积比出 现先减小后增加的趋势。 结论 选择基体表面与 靶表面垂直放置, 沉积时间 为 30 ~ 40 min 时, 薄膜的沉积厚度和减少大颗粒缺陷可以兼顾。 |
| 英文摘要: |
| Objective The effects of different placement orientation between substrate surface and target surface and the deposition time on the morphology and distribution of Ti macroparticles ( MPs) were studied. Methods TiN films were deposited on the substrate by the arc ion plating method, the surface morphology of the Ti films was observed by the Scanning electron microscopy ( SEM) method, and the amount and size of Ti MPs in the surface of TiN films were analyzed using the scientific image software ImageJ. Results When the distance between the target and the substrate was 25 cm, the amount and area fraction of MPs in the films were lower when the substrate surface and the target surface were placed perpendicularly, as compared to those when the substrate surface and the target surface were placed in parallel. Meanwhile, a typical strip shape MPs appeared. With the deposition time increasing from 5 min to 50 min, the amount and the area fraction showed a trend of first decreasing followed by increasing. Conclusion When the placement orientation was perpendicular between the substrate surface and the target surface, and the deposition time was 30 ~ 40 min, the deposition thickness of the film and the reduction of MPs could be achieved at the same time. |
| 查看全文 查看/发表评论 下载PDF阅读器 |
| 关闭 |
|
|
|
渝公网安备 50010702501715号