杜军,孟凡军,臧艳,郭蕾.磁控溅射沉积硬韧 ZrAlN 薄膜及薄膜力 学性能[J].表面技术,2014,43(5):1-5.
DU Jun,MENG Fan-jun,ZANG Yan,GUO Lei.Preparation and Mechanical Properties of Magnetron Sputtering ZrAlN Films with High Hardness and Good Toughness[J].Surface Technology,2014,43(5):1-5 |
| 磁控溅射沉积硬韧 ZrAlN 薄膜及薄膜力 学性能 |
| Preparation and Mechanical Properties of Magnetron Sputtering ZrAlN Films with High Hardness and Good Toughness |
| 投稿时间：2014-04-15 修订日期：2014-05-18 |
| DOI： |
| 中文关键词: 磁控溅射 硬度 韧性 ZrAlN 薄膜 |
| 英文关键词:magnetron sputter hardness toughness ZrAlN thin films |
| 基金项目:国家自 然科学基金( 51102283) |
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| Author | Institution |
| DU Jun | Department of Remanufacturing, Institute of Armored Force Engineering, Beijing 100072, China; National Key Laboratory for Remanufacturing, Institute of Armored Force Engineering, Beijing 100072, China |
| MENG Fan-jun | Department of Remanufacturing, Institute of Armored Force Engineering, Beijing 100072, China; National Key Laboratory for Remanufacturing, Institute of Armored Force Engineering, Beijing 100072, China |
| ZANG Yan | Department of Remanufacturing, Institute of Armored Force Engineering, Beijing 100072, China; National Key Laboratory for Remanufacturing, Institute of Armored Force Engineering, Beijing 100072, China |
| GUO Lei | Department of Remanufacturing, Institute of Armored Force Engineering, Beijing 100072, China; National Key Laboratory for Remanufacturing, Institute of Armored Force Engineering, Beijing 100072, China |
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| 中文摘要: |
| 目 的 获得具有高硬度、高韧性的 ZrAlN 薄膜。 方法 采用 磁控溅射技术在钛合金和单晶 Si 上沉积不同 Al 含量的 ZrAlN 薄膜, 对薄膜的 微观组织和相结构进行表征, 并测 试薄膜的 硬度( H) 、弹性模量( E) 和断裂韧性( KIC) 。 结果 当 Zr1-xAlxN 薄膜 x 分别 为 0. 05,0. 23,0. 47,0. 63 时, 对应的 硬度依次为 24. 5,40. 1,17. 1, 19. 1 GPa, 断裂韧性依次为 1. 47, 3. 17, 1. 13, 1. 58 MPa· m-0. 5。 x 为 0. 05 和 0. 23时, Al 固 溶到 ZrN 晶粒中, 形成 NaCl 型面心立方( FCC) 结构; x 为 0. 47 和 0. 63 时, 则 形成纤锌矿密排六方( HCP) AlN 第 二相。 结论 ZrAlN 薄膜的 硬度和韧性与 相组成密切相关。 Al 固 溶时, ZrAlN 的 硬度较高, 韧性较好; 超过固 溶极限, 形成六方 AlN 时, ZrAlN 硬度较低, 韧性较差。 相比之下, Zr0. 77 Al0. 23 N 薄膜同 时具备最高的硬度和最高的韧性。 |
| 英文摘要: |
| Objective To deposit ZrAlN coating with high hardness and good toughness. Methods ZrAlN thin films containing variable amounts of aluminum were deposited onto TC6 and Si wafers by magnetron sputtering Zr and Al target in an argon/nitrogen gas mixture. The microstructure and mechanical properties were characterized. The hardness ( H) , modulus of elasticity ( E) and fracture toughness ( KIC) of the film were tested. Results When the x of Zr1 -xAlxN films was 0. 05,0. 23,0. 47,0. 63, the corresponding hardness values were 24. 5, 40. 1, 17. 1, 19. 1 GPa, and the fracture toughness values were 1. 47, 3. 17, 1. 13, 1. 58 MPa· m-0. 5. When x was 0. 05 and 0. 23, Al was dissolved in ZrN grains, forming NaCl face centered cubic structure. When x was 0. 47 and 0. 63, wurtzite HCP AlN second phase was formed. Conclusion The hardness and toughness of ZrAlN film were closely related with the phase structure. When Al was dissolved in ZrAlN, the hardness and toughness of ZrAlN were relatively high. When the solubility limit was exceeded, HCP AlN was formed, the hardness and toughness of ZrAlN were relatively low. In contrast, Zr0. 77Al0. 23 N had the highest hardness and toughness. |
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