魏永强,张艳霞,文振华,蒋强,冯宪章.脉冲偏压占空比对TiN/TiAlN多层薄膜微观结构和硬度的影响[J].表面技术,2014,43(1):1-6,39.
WEI Yong-qiang,ZHANG Yan-xia,WEN Zhen-hua,JING Zhi-qiang,FEN Xian-zhang.Effects of Different Pulsed Bias Duty Cycle on the Microstructure and Hardness of TiN / TiAlN Multilayer Coatings[J].Surface Technology,2014,43(1):1-6,39 |
| 脉冲偏压占空比对TiN/TiAlN多层薄膜微观结构和硬度的影响 |
| Effects of Different Pulsed Bias Duty Cycle on the Microstructure and Hardness of TiN / TiAlN Multilayer Coatings |
| 投稿时间：2013-10-22 修订日期：2013-11-22 |
| DOI： |
| 中文关键词: TiN/TiAlN 电弧离子镀 纳米硬度 微观结构 脉冲偏压占空比 |
| 英文关键词:TiN/TiAlN arc ion plating nanohardness microstructure pulsed bias duty cycle |
| 基金项目:国家自然科学基金(51105344) ;航空科学基金(2012ZE55011) ;河南省教育厅科学技术研究重点项目( 13A430397,14A140026 ) ;河南省科技厅基础与前沿技术研究计划 ( 132300410241 ) ; 河南省高校科技创新团队支持计划( 2012IRTSTHN014 ) ; 郑州航院科研创新团队建设项目(2014TD01) |
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| Author | Institution |
| WEI Yong-qiang | Scool of Mechatronics Engineering, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China;Engineering Technology Research Center of Aviation Manufacturing & Equipment, University of Henan Province, Zhengzhou 50015, China |
| ZHANG Yan-xia | School of Mechatronics Engineering, Zhengzhou Vocational University of Information and Technology, Zhengzhou 450015, China |
| WEN Zhen-hua | Scool of Mechatronics Engineering, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China;Engineering Technology Research Center of Aviation Manufacturing & Equipment, University of Henan Province, Zhengzhou 50015, China |
| JING Zhi-qiang | Schol of Mechatronics Engineering, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China;Engineering Technology Research Center of Aviation Manufacturing & Equipment, University of Henan Province, Zhengzhou 50015, China |
| FEN Xian-zhang | Schol of Mechatronics Engineering, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China;Engineering Technology Research Center of Aviation Manufacturing & Equipment, University of Henan Province, Zhengzhou 50015, China |
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| 中文摘要: |
| 目的 研究脉冲偏压占空比对 TiN / TiAlN 多层薄膜微观结构和硬度的影响规律。 方法 利用脉冲偏压电弧离子镀的方法,改变脉冲偏压占空比,在 M2 高速钢表面制备 5 种 TiN / TiAlN 多层薄膜,对比研究了薄膜的微观结构、元素成分、相结构和硬度的变化规律。 结果 TiN / TiAlN 多层薄膜表面出现了电弧离子镀制备薄膜的典型生长形貌,随着脉冲偏压占空比的增加,薄膜表面的大颗粒数目明显减少。 此外,脉冲偏压占空比的增加还引起多层薄膜中 Al / Ti 原子比的降低。 结论 TiN / TiAlN 多层薄膜主要以(111 ) 晶面择优取向生长,此外还含有(311 ) ,(222 ) 和(200 ) 晶相结构。 5 种多层薄膜的纳米硬度均在 33GPa 以上,当脉冲偏压占空比为 20% 时,可实现超硬薄膜的制备。 |
| 英文摘要: |
| Objective To study the effects of pulsed bias duty cycle on the microstructure and hardness of TiN / TiAlN multilayer coatings. Methods Five TiN / TiAlN multilayer coatings with different pulsed bias duty cycle were deposited by the pulse biased arc ion plating method on M2 high speed steel substrates, and the microstructure, composition, phase structure and hardness of the multilayer coatings were investigated. Results TiN / TiAlN multilayer coatings surface exhibited a typical growth morphology prepared by arc ion plating. The amount of macroparticles was significantly reduced with increasing pulsed bias duty cycle. The increase of pulsed bias duty cycle also caused the decrease of Al / Ti atomic ratio in the multilayer coatings. Conlusion TiN / TiAlN multilayer coatings preferred (111) orientation growth, and meanwhile contained (311) , (222) and (200) crystallographic structure. The nanohardness of five multilayer coatings was higher than 33 GPa. At 20% pulsed bias duty cycle, the super hard coatings were prepared. |
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